Organosilicate polymer e-beam resists with high resolution, sensitivity and stability-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Organosilicate polymer e-beam resists with high resolution, sensitivity and stability

Published:2013-10-31 Issue:11 Volume:27 Page:644-651
ISSN:0268-2605
Container-title:Applied Organometallic Chemistry
language:en
Short-container-title:Appl. Organometal. Chem.

Author:

Lee Sung-Il¹,Sim Jae Hwan¹²,Lee Hae-Jeong²,Kasica Richard³,Kim Hyun-Mi⁴,Soles Christopher L.²,Kim Ki-Bum⁴,Yoon Do Y.¹

Affiliation:

1. Department of Chemistry; Seoul National University; Seoul 151-747 Korea

2. Materials Science and Engineering Division; National Institute of Standards and Technology; Gaithersburg MD 20899 USA

3. Center for Nanoscale Science and Technology; National Institute of Standards and Technology; Gaithersburg MD 20899 USA

4. Department of Materials Science and Engineering; Seoul National University; Seoul 151-747 Korea

Publisher

Wiley

Subject

Inorganic Chemistry,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/aoc.2985/fullpdf

Reference47 articles.

1. Lithography for enabling advances in integrated circuits and devices

2. Chemical Amplification in High-Resolution Imaging Systems

3. Radiation chemistry of polymeric materials: novel chemistry and applications for microlithography

4. High performance resist for EUV lithography

5. EUV Resist Screening: Current Performance and Issues

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of Chemical Structures on E-Beam Lithography Performance of Polysilsesquioxanes;ACS Applied Materials & Interfaces;2024-09-12

2. Advancing next generation nanolithography with infiltration synthesis of hybrid nanocomposite resists;Journal of Materials Chemistry C;2019

3. High resolution spin-on electron beam lithography resist with exceptional dry etching resistance;Applied Materials Today;2015-11

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3