Interfacial studies of Al2 O3 deposited on 4H-SiC(0001)-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Interfacial studies of Al2 O3 deposited on 4H-SiC(0001)

Published:2008-02-27 Issue:3-4 Volume:40 Page:822-825
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Diplas Spyros,Avice Marc,Thøgersen Annett,Christensen Jens S.,Grossner Ulrike,Svensson Bengt G.,Nilsen Ola,Fjellvåg Helmer,Hinder Steve,Watts John F.

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/sia.2787/fullpdf

Reference20 articles.

1. Intrinsic SiC/SiO2 Interface States

2. Oxidation of Silicon Carbide: Problems and Solutions

3. N₂O Processing Improves the 4H-SiC:SiO₂ Interface

4. The SiC-SiO₂ Interface: A Unique Advantage of SiC as a Wide Energy-Gap Material

5. High Channel Mobility 4H-SiC MOSFETs

Cited by 11 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Enhanced quality of Al2O3/SiC gate stack via microwave plasma annealing;Rare Metals;2024-06-07

2. High-temperature effects for transition state calculations in solids;The Journal of Chemical Physics;2023-11-27

3. High-k dielectrics for 4H-silicon carbide: present status and future perspectives;Journal of Materials Chemistry C;2021

4. Influence of annealing environment on the ALD-Al2O3/4H-SiC interface studied through XPS;Journal of Physics D: Applied Physics;2018-02-19

5. Interface between Al2O3and 4H-SiC investigated by time-of-flight medium energy ion scattering;Journal of Physics D: Applied Physics;2017-11-17

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3