Enhanced quality of Al2O3/SiC gate stack via microwave plasma annealing-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Enhanced quality of Al2O3/SiC gate stack via microwave plasma annealing

Published:2024-06-07 Issue: Volume: Page:
ISSN:1001-0521
Container-title:Rare Metals
language:en
Short-container-title:Rare Met.

Author:

You Nan-Nan,Liu Xin-Yu,Zhang Qian,Wang Zhen,Wang Jia-Yi,Xu Yang,Li Xiu-Yan,Guo Yu-Zheng^ORCID,Wang Sheng-Kai^ORCID

Funder

Beijing Municipal Natural Science Foundation

National Natural Science Foundation of China

Out-standing Member Project of the Youth Innovation Promotion Association of CAS

Scientific Instrument Developing Project of the Chinese Academy of Sciences

Publisher

Springer Science and Business Media LLC

Link

https://link.springer.com/content/pdf/10.1007/s12598-024-02781-y.pdf

Reference50 articles.

1. Cooper JA, Agarwal A. SiC power-switching devices-the second electronics revolution? Proc IEEE. 2002;90(6):956. https://doi.org/10.1109/JPROC.2002.1021561.

2. Hudgins JL. Wide and narrow bandgap semiconductors for power electronics: a new valuation. J Electron Mater. 2003;32(6):471. https://doi.org/10.1007/s11664-003-0128-9.

3. Liu XY, Hao JL, You NN, Bai Y, Tang YD, Yang CY, Wang SK. High-mobility SiC MOSFET with low density of interface traps using high pressure microwave plasma oxidation. Chin Phys B. 2020;29(3):037301. https://doi.org/10.1088/1674-1056/ab68c0.

4. Afanasev VV, Bassler M, Pensl G, Schulz M. Intrinsic SiC/SiO2 interface states. Phys Stat Sol. 1997;162(1):321. https://doi.org/10.1002/1521-396X(199707)162.

5. Watanabe H, Hosoi T, Kirino T, Kagei Y, Uenishi Y, Chanthaphan A, Yoshigoe A, Teraoka Y, Shimura T. Synchrotron X-ray photoelectron spectroscopy study on thermally grown SiO2/4H-SiC (0001) interface and its correlation with electrical properties. Appl Phys Lett. 2011;99(2):021907. https://doi.org/10.1063/1.3610487.

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3