Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD-Reference-Cited by-同舟云学术

Island Coalescence during Film Growth: An Underestimated Limitation of Cu ALD

Author:

Hagen Dirk J.¹,Connolly James²³,Povey Ian M.³,Rushworth Simon⁴,Pemble Martyn E.⁵

Affiliation:

1. Inorganic Chemistry Laboratory; Department of Chemistry and Materials Sciences; Aalto University; Espoo FI-00076 Aalto Finland

2. Applied Materials, Inc.; Santa Clara CA 95054-3299 USA

3. Tyndall National Institute; University College Cork; Cork T12 YN60 Ireland

4. EpiValence Ltd; Thornton Science Park; University of Chester; Pool Lane Chester CH2 4NU UK

5. Department of Chemistry and Tyndall National Institute; University College Cork; Cork T12 YN60 Ireland

Funder

Science Foundation Ireland Strategic Research Cluster Grant entitled

Functional Oxides and Related Materials for Electronics

Science Foundation Ireland

Irish Research Council for Science, Engineering and Technology

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Reference12 articles.

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