Stabilizing the Wettability of Initiated Chemical Vapor Deposited (iCVD) Polydivinylbenzene Thin Films by Thermal Annealing-Reference-Cited by-同舟云学术

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Stabilizing the Wettability of Initiated Chemical Vapor Deposited (iCVD) Polydivinylbenzene Thin Films by Thermal Annealing

Published:2017-05-26 Issue:18 Volume:4 Page:1700270
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Zhao Junjie¹,Wang Minghui¹,Gleason Karen K.¹

Affiliation:

1. Department of Chemical Engineering Massachusetts Institute of Technology 77 Massachusetts Avenue Cambridge MA 02139 USA

Funder

Kuwait Foundation for the Advancement of Sciences

U.S. Army Corps of Engineers

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.201700270

Reference56 articles.

1. Overview of Chemically Vapor Deposited (CVD) Polymers

2. 25th Anniversary Article: CVD Polymers: A New Paradigm for Surface Modifi cation and Device Fabrication

3. CVD Polymers for Devices and Device Fabrication

4. Dynamic Studies on the Response to Humidity of Poly (2-hydroxyethyl methacrylate) Hydrogels Produced by Initiated Chemical Vapor Deposition

5. Graft Polymerization of Anti-Fouling PEO Surfaces by Liquid-Free Initiated Chemical Vapor Deposition

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