Direct Photopatterning of Solution-Processed Amorphous Indium Zinc Oxide and Zinc Tin Oxide Semiconductors-A Chimie Douce Molecular Precursor Approach to Thin Film Electronic Oxides-Reference-Cited by-同舟云学术

Direct Photopatterning of Solution-Processed Amorphous Indium Zinc Oxide and Zinc Tin Oxide Semiconductors-A Chimie Douce Molecular Precursor Approach to Thin Film Electronic Oxides

Published:2018-06-27 Issue:15 Volume:5 Page:1800324
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Sanctis Shawn¹^ORCID,Hoffmann Rudolf C.¹,Bruns Michael²,Schneider Jörg J.¹^ORCID

Affiliation:

1. Fachbereich Chemie; Eduard-Zintl-Institut für Anorganische and Physikalische Chemie; Technische Universität Darmstadt; Alarich-Weiss-Straße 12 64287 Darmstadt Germany

2. Institute for Applied Materials - Energy Storage Systems (IAM-ESS); Karlsruhe Institute of Technology (KIT); Hermann-von-Helmholtz-Platz 1 D-76344 Eggenstein-Leopoldshafen Germany

Funder

Deutsche Forschungsgemeinschaft

Karlsruher Institut für Technologie

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/admi.201800324/fullpdf

Reference47 articles.

1. Material characteristics and applications of transparent amorphous oxide semiconductors

2. Solution Processable Metal Oxide Thin Film Deposition and Material Growth for Electronic and Photonic Devices