Reliability issues of amorphous oxide semiconductor-based thin film transistors-Reference-Cited by-同舟云学术

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Reliability issues of amorphous oxide semiconductor-based thin film transistors

Published:2024 Issue:35 Volume:12 Page:13707-13726
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Shen Yuxuan¹,Zhang Meng¹²,He Siyuan¹,Bian Le¹,Liu Jiaxin¹,Chen Zhengyu¹,Xue Shuangmei¹²,Zhou Ye¹^ORCID,Yan Yan¹²^ORCID

Affiliation:

1. State Key Laboratory of Radio Frequency Heterogeneous Integration (Shenzhen University), Shenzhen 518060, China

2. College of Electronics and Information Engineering (Shenzhen University), Shenzhen 518060, China

Abstract

This review summarizes and discusses existing literature on reliability issues of amorphous oxide semiconductor thin-film transistors. The investigation focuses on bias stress, electro-static discharge, bending, and radiation reliability.

Funder

National Natural Science Foundation of China

Shenzhen Science and Technology Innovation Program

Publisher

Royal Society of Chemistry (RSC)

Link

http://pubs.rsc.org/en/content/articlepdf/2024/TC/D4TC01392A

Reference196 articles.

1. Metal oxide semiconductors with highly concentrated oxygen vacancies for gas sensing materials: A review

2. High-performance trimethylamine gas sensors based on defect-engineering MOF-derived ZnO nanoclusters with tunable surface oxygen vacancies

3. Modulation of optical and electrical properties of In2O3 films deposited by high power impulse magnetron sputtering by controlling the flow rate of oxygen

4. Basic materials physics of transparent conducting oxides

5. Limitations of In2O3 as a transparent conducting oxide

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