Repair of defects created by Ar+ sputtering on graphite surface by annealing as confirmed using ToF-SIMS and XPS-Reference-Cited by-同舟云学术

Repair of defects created by Ar+ sputtering on graphite surface by annealing as confirmed using ToF-SIMS and XPS

Author:

Xie Wenjing¹,Weng Lu-Tao²³,Yeung King Lun¹²,Chan Chi-Ming¹²^ORCID

Affiliation:

1. Hong Kong University of Science and Technology; Division of Environment and Sustainability; Clear Water Bay Hong Kong

2. Hong Kong University of Science and Technology; Department of Chemical and Biological Engineering; Clear Water Bay Hong Kong

3. Hong Kong University of Science and Technology; Materials Characterization and Preparation Facility; Clear Water Bay Hong Kong

Funder

Research Grants Council of the Hong Kong Special Administrative Region, China

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

Reference42 articles.

1. Review graphite;Chung;J Mater Sci,2002

4. The rise of graphene;Geim;Nat Mater,2007

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