Lasing Threshold Reduction of AlGaN‐Based Ultraviolet‐C Laser Diodes Using Strain Relaxed Lower Cladding Layer

Author:

Ren Rui12,Liu Zhibin12ORCID,Guo Yanan12,Wang Chong3,Liu Naixin12,Wang Junxi12,Li Jinmin12,Yan Jianchang12

Affiliation:

1. Research and Development Center for Solid State Lighting Institute of Semiconductors Chinese Academy of Sciences Beijing 100083 China

2. Center of Materials Science and Optoelectronics Engineering University of Chinese Academy of Sciences Beijing 100049 China

3. Zhongke Lu'an Semiconductor Technology Research Institute Shanxi 046000 China

Abstract

The dependence of the performance of ultraviolet‐C (UV‐C) laser diodes on the strain relaxation of lower cladding layer (LCL) is numerically investigated. As the strain relaxation increases from 0% to 100%, the threshold current density decreases from 25 to 12.7 kA cm−2, and the slope efficiency increases from 0.039 to 0.087 W A−1, thanks to an increase in internal quantum efficiency (IQE). The improvement of IQE is mainly due to the enhanced hole injection resulting from the increased hole concentration in the distributed polarization doping layers and the reduced hole blocking barrier height of the upper waveguide layer with increasing the strain relaxation. Additionally, the effective screening of the polarization field within the quantum well ameliorates the quantum‐confined Stark effect, further improving the IQE. Our study reveals that strain relaxed LCL is imperative to achieve low‐threshold UV‐C laser diodes.

Publisher

Wiley

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. High-Power and High-Efficiency 221 nm AlGaN Far Ultraviolet Laser Diodes;ECS Journal of Solid State Science and Technology;2024-07-01

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