X‐ray microscopy and automatic detection of defects in through silicon vias in three‐dimensional integrated circuits
Author:
Affiliation:
1. Institute for Nanotechnology and Correlative Microscopy gGmbH Forchheim Germany
2. Fraunhofer IKTS Forchheim Germany
3. Siemens Healthineers Forchheim Germany
Funder
Bayerische Staatsministerium für Wirtschaft, Landesentwicklung und Energie
H2020 European Research Council
Publisher
Wiley
Subject
General Engineering,General Computer Science
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/eng2.12520
Reference59 articles.
1. HummlerK SmithL CaramtoR et al.On the technology and ecosystem of 3D/TSV manufacturing. Proceedings of the SEMI Advanced Semiconductor Manufacturing Conference;2011:1‐6; IEEE Saratoga Springs New York NY.
2. JingX YuD WanL.Non‐destructive testing of through silicon vias by high‐resolution X‐ray/CT techniques. Proceedings of the 14th Electronics Packaging Technology Conference (EPTC);2012:533‐536; IEEE.
3. Measuring thermally induced void growth in conformally filled through-silicon vias (TSVs) by laboratory x-ray microscopy
4. 3D Microelectronic Packaging
5. New insights into fracture of Si in Cu-filled through silicon via during and after thermal annealing
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