The use of a novel image-shearing technique on a scanning electron microscope for comparative measurement of linewidths on photomasks-Reference-Cited by-同舟云学术

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The use of a novel image-shearing technique on a scanning electron microscope for comparative measurement of linewidths on photomasks

Published:1989 Issue:5 Volume:11 Page:213-217
ISSN:0161-0457
Container-title:Scanning
language:en
Short-container-title:Scanning

Author:

Nunn J. W.,Turner N. P.

Publisher

Wiley

Subject

Instrumentation,Atomic and Molecular Physics, and Optics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/sca.4950110503/fullpdf

Reference5 articles.

1. Application of optical microscopy to dimensional measurements in microelectronics;Downs;SPIE,1982

2. Topographic contrast in linewidth measurement with the scanning electron microscope;Miyoshi;J Electr Microsc,1986

3. Linewidth metrology for Xray masks with sub-halfmicron feature size;Mescheder;Microelectr Eng,1987

4. Edge recognition in SEM metrology;Mancuso;SPIE,1985

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Metrology of vlsi critical element sizes;Measurement Techniques;1999-01

2. Calibration of a scanning electron microscope with a diffraction grating;Measurement Techniques;1995-09

3. Application of Monte Carlo modelling in the measurement of photomask linewidths at the national physical laboratory;Scanning;1995-09

4. High-precision method of measuring linear dimensions in a raster electron microscope;Measurement Techniques;1994-06

5. Comparison between the experimental and theoretical modeling of linewidth measurements on photomasks and their insensitivity to accelerating voltage in the scanning electron microscope;Scanning;1990-09

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