Application of Monte Carlo modelling in the measurement of photomask linewidths at the national physical laboratory

Author:

Nunn John W.

Publisher

Wiley

Subject

Instrumentation,Atomic and Molecular Physics, and Optics

Reference5 articles.

1. Inst Phys Conf Ser No. 93;Joy,1988

2. Comparison between the experimental and theoretical modelling of linewidth measurements on photomasks;Nunn;Scanning,1990

3. The use of a novel image shearing technique on a scanning electron microscope for comparative measurement of linewidths on photomasks;Nunn;Scanning,1989

4. Linewidth measurement comparison between a photometric optical microscope and a scanning electron microscope backed with Monte Carlo trajectory computations;Nunn;SPIE,1991

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