Comparison between the experimental and theoretical modeling of linewidth measurements on photomasks and their insensitivity to accelerating voltage in the scanning electron microscope
Author:
Publisher
Wiley
Subject
Instrumentation,Atomic and Molecular Physics, and Optics
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/sca.4950120504/fullpdf
Reference2 articles.
1. Joy DC An introduction to Monte Carlo simulations Inst Phys Conf Ser No 93 1 32 1988
2. The use of a novel image-shearing technique on a scanning electron microscope for comparative measurement of linewidths on photomasks;Nunn;Scanning,1989
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