Ambient‐Stable 2D Dion–Jacobson Phase Tin Halide Perovskite Field‐Effect Transistors with Mobility over 1.6 Cm2 V−1 s−1

Author:

Qiu Xincan1234,Xia Jiangnan134,Liu Yu134,Chen Ping‐An134,Huang Lanyu5,Wei Huan134,Ding Jiaqi134,Gong Zhenqi134,Zeng Xi134,Peng Chengyuan134,Chen Chen6,Wang Xiao5,Jiang Lang7,Liao Lei1,Hu Yuanyuan134ORCID

Affiliation:

1. Changsha Semiconductor Technology and Application Innovation Research Institute College of Semiconductors (College of Integrated Circuits) Hunan University Changsha 410082 China

2. Key Laboratory of Hunan Province for 3D Scene Visualization and Intelligence Education (2023TP1038) School of Electronic Information Hunan First Normal University Changsha 410205 China

3. Shenzhen Research Institute of Hunan University Shenzhen 518063 China

4. International Science and Technology Innovation Cooperation Base for Advanced Display Technologies of Hunan Province School of Physics and Electronics Hunan University Changsha 410082 China

5. School of Physics and Electronics Hunan University Changsha 410082 China

6. Science and Technology on Advanced Ceramic Fibers and Composites Laboratory College of Aerospace Science and Engineering National University of Defense Technology Changsha 410000 China

7. Beijing National Laboratory for Molecular Sciences Institute of Chemistry Chinese Academy of Sciences Beijing 100190 China

Abstract

AbstractSolution‐processed metal halide perovskites hold immense potential for the advancement of next‐generation field‐effect transistors (FETs). However, the instability of perovskite‐based transistors has impeded their progress and practical applications. Here, ambient‐stable high‐performance FETs based on 2D Dion–Jacobson phase tin halide perovskite BDASnI4, which has high film quality and excellent electrical properties, are reported. The perovskite channels are established by engineering the film crystallization process via the employment of ammonium salt interlayers and the incorporation of NH4SCN additives within the precursor solution. The refined FETs demonstrate field‐effect hole mobilities up to 1.61 cm2 V−1 s−1 and an on/off ratio surpassing 106. Moreover, the devices show impressive operational and environmental stability and retain their functional performance even after being exposed to ambient conditions with a temperature of 45 °C and humidity of 45% for over 150 h.

Funder

National Key Research and Development Program of China

National Natural Science Foundation of China

Natural Science Foundation of Hunan Province

Shenzhen Science and Technology Innovation Program

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

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