Shape changes of voids in bamboo lines: A new electromigration failure mechanism
Author:
Publisher
Wiley
Subject
Management Science and Operations Research,Safety, Risk, Reliability and Quality
Reference18 articles.
1. ‘Electromigration and related failure mechanisms in integrated circuit interconnects’, International Materials Reviews, in press.
2. and , ‘Phenomenological observations on electromigration’, 21st Annual Proc. of IEEE IRPS, 1983, pp. 1–9.
3. Electromigration in a single crystalline submicron width aluminum interconnection
4. Insituobservations of dc and ac electromigration in passivated Al lines
5. Insituscanning electron microscopy observation of the dynamic behavior of electromigration voids in passivated aluminum lines
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Samarium influence on current induced atomic displacement in Aluminium and Copper combinatorial thin film alloys;Thin Solid Films;2020-05
2. Customized 2D Structures for High Throughput Electromigration Measurements;physica status solidi (a);2019-06
3. Phase-Field Study of Electromigration-Induced Shape Evolution of a Transgranular Finger-Like Slit;Journal of Electronic Materials;2018-08-31
4. Current-Induced Transport: Electromigration;In-Situ Electron Microscopy;2012-04-24
5. Morphological evolution of voids by surface drift diffusion driven by capillary, electromigration, and thermal-stress gradients induced by steady-state heat flow in passivated metallic thin films and flip chip solder joints. I. Theory;Journal of Applied Physics;2008-07-15
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3