Electromigration in a single crystalline submicron width aluminum interconnection
Author:
Publisher
AIP Publishing
Subject
Physics and Astronomy (miscellaneous)
Link
http://aip.scitation.org/doi/pdf/10.1063/1.104431
Reference8 articles.
1. Electromigration failure modes in aluminum metallization for semiconductor devices
2. Simple estimate of electromigration failure in metallic thin films
3. ELECTROMIGRATION IN SINGLE‐CRYSTAL ALUMINUM FILMS
4. Epitaxial Growth of Al on Si by Gas-Temperature-Controlled Chemical Vapor Deposition
5. Gas-Temperature-Controlled (GTC) CVD of Aluminum and Aluminum-Silicon Alloy Film for VLSI Processing
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