Electromagnetic Functionalization of Wide-Bandgap Dielectric Oxides by Boron Interstitial Doping

Author:

Park Dae-Sung12ORCID,Rees Gregory J.3,Wang Haiyuan4,Rata Diana2,Morris Andrew J.5,Maznichenko Igor V.2,Ostanin Sergey26,Bhatnagar Akash12,Choi Chel-Jong7,Jónsson Ragnar D. B.8,Kaufmann Kai9,Kashtiban Reza3,Walker Marc3,Chiang Cheng-Tien26,Thorsteinsson Einar B.8,Luo Zhengdong3,Park In-Sung10,Hanna John V.3,Mertig Ingrid26,Dörr Kathrin2,Gíslason Hafliði P.8,McConville Chris F.311

Affiliation:

1. Zentrum für Innovationskompetenz SiLi-nano; 06120 Halle Germany

2. Institut für Physik; Martin-Luther-Universität Halle-Wittenberg; 06120 Halle Germany

3. Department of Physics; University of Warwick; Coventry CV4 7AL UK

4. Fritz-Haber-Institut der Max-Planck-Gesellschaft; 14195 Berlin Germany

5. School of Metallurgy and Materials; University of Birmingham; B15 2TT Birmingham UK

6. Max-Planck-Institut für Mikrostrukturphysik; 06120 Halle Germany

7. School of Semiconductor and Chemical Engineering; Chonbuk National University; Jeonju 54596 Republic of Korea

8. Science institute; University of Iceland; Reykjavik IS-104 Iceland

9. Fraunhofer Center for Silicon Photovoltaics CSP; Halle 06120 Germany

10. Institute of Nano Science and Technology; Hanyang University; Seoul 04763 Republic of Korea

11. College of Science; Engineering & Health; RMIT University; Melbourne VIC 3000 Australia

Funder

Deutsche Forschungsgemeinschaft

Bundesministerium für Bildung und Forschung

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

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