Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template-Reference-Cited by-同舟云学术

Directed Self-Assembly of Poly(2-vinylpyridine)-b-polystyrene-b-poly(2-vinylpyridine) Triblock Copolymer with Sub-15 nm Spacing Line Patterns Using a Nanoimprinted Photoresist Template

Published:2015-06-18 Issue:29 Volume:27 Page:4364-4370
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

Sun Zhiwei¹,Chen Zhenbin²,Zhang Wenxu¹,Choi Jaewon¹,Huang Caili¹,Jeong Gajin¹,Coughlin E. Bryan¹,Hsu Yautzong³,Yang XiaoMin³,Lee Kim Y.³,Kuo David S.³,Xiao Shuaigang³,Russell Thomas P.¹

Affiliation:

1. Department of Polymer Science and Engineering; University of Massachusetts Amherst; 120 Governors Drive Amherst MA 01003 USA

2. College of Materials Science and Engineering; Lanzhou University of Technology; Lanzhou 730050 Gansu China

3. Seagate Technology; LLD; 47010 Kato Road Fremont CA 94538 USA

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Reference48 articles.

1. Polarity-Switching Top Coats Enable Orientation of Sub–10-nm Block Copolymer Domains

2. Evolutionary Optimization of Directed Self-Assembly of Triblock Copolymers on Chemically Patterned Substrates

3. Topcoat Approaches for Directed Self-Assembly of Strongly Segregating Block Copolymer Thin Films