Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Nanoimprint Lithography and the Role of Viscoelasticity in the Generation of Residual Stress in Model Polystyrene Patterns

Published:2008-06-10 Issue:12 Volume:18 Page:1854-1862
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv. Funct. Mater.

Author:

Ding Yifu,Ro Hyun Wook,Alvine Kyle J.,Okerberg Brian C.,Zhou Jing,Douglas Jack F.,Karim Alamgir,Soles Christopher L.

Funder

NIST Office of Microelectronic Programs. K. J. Alvine

B. C. Okerberg

National Research Council NIST Postdoctoral Fellowship Program

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/adfm.200701402/fullpdf

Reference43 articles.

1. Imprint Lithography with 25-Nanometer Resolution

2. Imprint of sub‐25 nm vias and trenches in polymers

3. Nanoimprint lithography

4. Fabrication of 5nm linewidth and 14nm pitch features by nanoimprint lithography

5. Problems of the nanoimprinting technique for nanometer scale pattern definition

Cited by 30 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. State-of-the-art surface patterned membranes fabrication and applications: A review of the current status and future directions;Chemical Engineering Research and Design;2023-08

2. Effects of chain ends and densities on the glass transition of polymer thin films probed by linear and cyclic polystyrene;Polymer;2022-06

3. Spontaneous capillary breakup of suspended gradient polymer stripes into spatially ordered dot arrays;Applied Surface Science;2019-05

4. Hierarchically Patterned Elastomeric and Thermoplastic Polymer Films through Nanoimprinting and Ultraviolet Light Exposure;ACS Omega;2018-11-13

5. Effect of molecular weight, branching and temperature on dynamics of polypropylene melts at very high shear rates;Polymer;2018-05

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3