Photoresist development by plasma-Reference-Cited by-同舟云学术

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Photoresist development by plasma

Published:1980-11 Issue:16 Volume:20 Page:1093-1096
ISSN:0032-3888
Container-title:Polymer Engineering and Science
language:en
Short-container-title:Polym. Eng. Sci.

Author:

Hughes H. G.,Goodner W. R.,Wood T. E.,Smith J. N.,Keller J. V.

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,General Chemistry,Materials Chemistry,Polymers and Plastics,General Chemistry

Reference7 articles.

1. presentation Fifth Annual Tegal Tech. Seminar, Belmont, Calif. (1979).

2. Forecast of VLSI processing—A historical review of the first dry-processed IC

3. and ?Photopolymers: Principals, Processes, and Materials,?, p. 119 SPE Preprint, Ellenville, N.Y. (1973).

4. Kodak Microelectronics Seminar-Interface 1973, 20 (1973).

5. and Kodak Microelectronics Seminar-Interface 1979 Proc., p. 51 (Oct. 1979).

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Dry Etching for Microelectronics-A Bibliography;Dry Etching for Microelectronics;1984

2. Plasma developable positive UV -resists;Microelectronic Engineering;1983-09

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