Plasma developable positive UV -resists

Author:

Meyer W.H.,Curtis B.J.,Brunner H.R.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference13 articles.

1. High resolution pattern transfer by dry etching;Lehmann,1980

2. Plasma-developed X-ray resists;Taylor;J. Electrochem. Soc.,1980

3. Photoresist development by plasma;Hughes;Polym. Engrg Sci.,1980

4. Novel plasma developable resist compositions;Tsuda;J. Vac. Sci. Techn.,1981

5. The physics and chemistry of the lithographic process;Bowden;J. Electrochem. Soc.,1981

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1. Polyphthalaldehyde: Synthesis, Derivatives, and Applications;Macromolecular Rapid Communications;2017-11-06

2. Electron beam and X-ray resists;Advanced Materials for Optics and Electronics;1994-03

3. Polymeric silicon-containing resist materials;Advanced Materials for Optics and Electronics;1994-03

4. Plasma-Developable Photoresists Using Photoinduced Acid-Catalyzed Desilylation;Advanced Materials '93;1994

5. A polymer complex as a new type of electron beam resist for dry development;Polymer Engineering and Science;1988-07

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