Electron beam and X-ray resists
Author:
Publisher
Wiley
Subject
General Chemical Engineering,Electronic, Optical and Magnetic Materials
Reference60 articles.
1. Factors affecting the sensitivity of e-beam resists
2. Contrast in the electron‐beam lithography of substituted aromatic homopolymers and copolymers
3. Analysis of radiation chemical yields of chlorinated polystyrene derivatives
4. Chloromethylated Polystyrene as a Dry Etching‐Resistant Negative Resist for Submicron Technology
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