Publisher
Institute of Electrical and Electronics Engineers (IEEE)
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Cited by
24 articles.
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1. Plasma etching: Yesterday, today, and tomorrow;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2013-09
2. Model for aspect ratio dependent etch modulated processing;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2010-03
3. Plasma developable photoresist systems based on chemical amplification;Chemistry of Materials;1991-05-01
4. Plasma Etching of Organic Polymers;Plasma Deposition, Treatment, and Etching of Polymers;1990
5. References;Thin Films by Chemical Vapour Deposition;1990