High Temperature Thermal Conductivity of Amorphous Al2O3Thin Films Grown by Low Temperature ALD-Reference-Cited by-同舟云学术

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High Temperature Thermal Conductivity of Amorphous Al2O3Thin Films Grown by Low Temperature ALD

Published:2013-08-06 Issue:11 Volume:15 Page:1046-1050
ISSN:1438-1656
Container-title:Advanced Engineering Materials
language:en
Short-container-title:Adv. Eng. Mater.

Author:

Cappella Andrea¹²,Battaglia Jean-Luc¹,Schick Vincent¹,Kusiak Andrzej¹,Lamperti Alessio³,Wiemer Claudia³,Hay Bruno²

Affiliation:

1. Université de Bordeaux; Institut de Mécanique et d'Ingénierie de Bordeaux I; UMR CNRS 5426, 351 cours de la libération 33405 Talence France

2. Laboratoire National de Métrologie et d'Essais; LNE; 29 rue Roger Hennequin 78197 Trappes France

3. Laboratorio MDM; IMM-CNR; via C. Olivetti 2 20864 Agrate Brianza (MB) Italy

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/adem.201300132/fullpdf

Reference24 articles.

1. Low Temperature Plasma-Enhanced Atomic Layer Deposition of Metal Oxide Thin Films

2. Low-Temperature Al2O3 Atomic Layer Deposition

3. Atomic layer deposited Al2O3 as a capping layer for polymer based transistors

4. EFFECTS OF BARRIER LAYERS ON THE ELECTRICAL BEHAVIORS OF PHASE-CHANGE MEMORY DEVICES USING Sb-RICH Ge-Sb-Te FILMS

5. Thermal Conductivity of Anodic Alumina Film at (220 to 480) K by Laser Flash Technique

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