Morphological Stability Limits of Ag–Cu–Al Nanocrystalline Thin Films Prepared via Reactive Sputtering in Ar–O2 Mixed Gas

Author:

Ueshima Yoshiyuki,Hasegawa Masakatsu,Kubota Naoyoshi,Matamura Yuya,Matsubara Eiichiro,Seki Kazuaki,Hirato Tetsuji

Publisher

Springer Science and Business Media LLC

Reference35 articles.

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3. R. Kiebach, S. Pirou, L.M. Aguilera, A.B. Haugen, A. Kaiser, P.V. Hendriksen, M. Balaguer, J. García-Fayos, J.M. Serra, F. Schulze-Küppers, M. Christie, L. Fischer, W.A. Meulenberg, and S. Baumann: J. Mater. Chem. A, 2022, vol. 10, pp. 2152–95.

4. M. Jha and N. Gaur: J. Fam. Med. Prim. Care, 2022, vol. 11, pp. 1231–36.

5. H. Aljaghoub, S. Alasad, A. Alashkar, M. AlMallahi, R. Hasan, K. Obaideen, and A.H. Alami: Int. J. Thermofluids, 2023, vol. 17, p. 100261.

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