Advanced Raman Spectroscopy Using Nanofocusing of Light
Author:
Affiliation:
1. imec, Kapeldreef 75; B-3001 Leuven Belgium
2. Dept. of Materials Engineering; KU Leuven B-3001 Leuven Belgium
3. Instituut voor Kern- en Stralingsfysica; KU Leuven B-3001 Leuven Belgium
Publisher
Wiley
Subject
Condensed Matter Physics,General Materials Science
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/adem.201600612/fullpdf
Reference33 articles.
1. Micro-Raman spectroscopy to study local mechanical stress in silicon integrated circuits
2. Effect of static uniaxial stress on the Raman spectrum of silicon
3. J. Mitard L. Witters H. Arimura Y. Sasaki A. P. Milenin R. Loo A. Hikavyy G. Eneman P. Lagrain H. Mertens S. Sioncke C. Vrancken H. Bender K. Barla N. Horiguchi A. Mocuta N. Collaert A. V.-Y. Thean IEEE International Electron Devices Meeting EEE Inc Piscataway, NJ 2014 16.5.1
4. Evaluation of Anisotropic Biaxial Stress in Thin Strained-SiGe Layer Using Surface Enhanced Raman Spectroscopy
5. Electrical field analysis of metal-surface plasmon resonance using a biaxially strained Si substrate
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