Robust Free‐Standing Nano‐Thin SiC Membranes Enable Direct Photolithography for MEMS Sensing Applications-Reference-Cited by-同舟云学术

Robust Free‐Standing Nano‐Thin SiC Membranes Enable Direct Photolithography for MEMS Sensing Applications

Published:2017-12-15 Issue:1 Volume:20 Page:1700858
ISSN:1438-1656
Container-title:Advanced Engineering Materials
language:en
Short-container-title:Adv. Eng. Mater.

Author:

Phan Hoang‐Phuong¹^ORCID,Nguyen Tuan‐Khoa¹^ORCID,Dinh Toan¹^ORCID,Iacopi Alan¹,Hold Leonie¹,Shiddiky Muhammad J. A.¹^ORCID,Dao Dzung Viet¹,Nguyen Nam‐Trung¹^ORCID

Affiliation:

1. Queensland Micro and Nanotechnology Centre, Griffith UniversityWest Creek RoadNathanQld 4111Australia

Funder

Australian Research Council

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/adem.201700858

Reference37 articles.

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2. Ultrahigh-quality silicon carbide single crystals

3. Experimental Investigation of Piezoresistive Effect in p-Type 4H–SiC

4. Transient-Current Method for Measurement of Active Near-Interface Oxide Traps in 4H-SiC MOS Capacitors and MOSFETs

5. Mechanical characterization between room temperature and 1000 °C of SiC free-standing thin films by a novel high-temperature micro-tensile setup

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