An improved model for boron diffusion and activation in silicon

Author:

Kwok Charlotte T. M.,Braatz Richard D.,Paul Silke,Lerch Wilfried,Seebauer Edmund G.

Publisher

Wiley

Subject

General Chemical Engineering,Environmental Engineering,Biotechnology

Reference44 articles.

1. The International Technology Roadmap for Semiconductors, 2006. Available at: http://www.itrs.net/Links/2006update/2006UpdateFinal.htm

2. Physical insight into boron activation and redistribution during annealing after low-temperature solid phase epitaxial regrowth;Aboy;Appl Phys Lett.,2006

3. Effect of ramp rates during rapid thermal annealing of ion implanted boron for formation of ultra-shallow junctions;Agarwal;J Electron Mater.,1999

4. Flash lamp annealing with millisecond pulses for ultra-shallow boron profiles in silicon;Gebel;Nucl Instrum Methods Phys Res B.,2002

5. Application of excimer laser annealing in the formation of ultrashallow p+/n junctions;Chong;Adv Microelectronic Process Tech.,2000

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