From Doping to Dilution: Local Chemistry and Collective Interactions of La in HfO <sub>2</sub>-Reference-Cited by-同舟云学术

From Doping to Dilution: Local Chemistry and Collective Interactions of La in HfO ₂

Published:2022-02-20 Issue: Volume: Page:2100582
ISSN:1862-6254
Container-title:physica status solidi (RRL) – Rapid Research Letters
language:en
Short-container-title:Physica Rapid Research Ltrs

Author:

Szyjka Thomas¹²,Baumgarten Lutz²^ORCID,Rehm Oliver¹,Richter Claudia³^ORCID,Matveyev Yury⁴^ORCID,Schlueter Christoph⁴^ORCID,Mikolajick Thomas³⁵^ORCID,Schroeder Uwe³^ORCID,Müller Martina¹^ORCID

Affiliation:

1. Fachbereich Physik Universität Konstanz 78457 Konstanz Germany

2. Forschungszentrum Jülich GmbH Peter Grünberg Institut (PGI-6) 52425 Jülich Germany

3. NaMLab gGmbH Noethnitzer Str. 64a 01187 Dresden Germany

4. Deutsches Elektronen-Synchrotron Notkestraße 85 22607 Hamburg Germany

5. Chair of Nanoelectronic TU Dresden 01062 Dresden Germany

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssr.202100582

Reference32 articles.

1. H.Kohlstedt Y.Mustafa A.Gerber A.Petraru M.Fitsilis R.Meyer U.Böttger R.Waser in14th Biennial Conf. on Insulating Films on Semiconductors Elsevier Amsterdam Leuven Belgium Vol.80 2005 p.296.

2. F. P. G.Fengler M.Pešić S.Starschich T.Schneller U.Böttger T.Schenk M. H.Park T.Mikolajick U.Schroeder in2016 46th European Solid-State Device Research Conf. (ESSDERC) IEEE Lausanne Switzerland2016 pp.369–372.

3. Review and perspective on ferroelectric HfO2-based thin films for memory applications

4. Ferroelectricity in hafnium oxide thin films

5. Origin of Ferroelectric Phase in Undoped HfO 2 Films Deposited by Sputtering

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