Mobility Limitations due to Dislocations and Interface Roughness in AlGaN/AlN/GaN Heterostructure

Author:

Li Qun1,Zhang Jingwen1,Meng Li1,Chong Jing2,Hou Xun1

Affiliation:

1. Key Laboratory for Physical Electronics and Devices of the Ministry of Education, Key Laboratory of Photonics Technology for Information of Shaanxi Province, and ISCAS-XJTU Joint Laboratory of Functional Materials and Devices for Informatics, School of Electronics and Information Engineering, Xi’an Jiaotong University, Xi’an 710049, China

2. China Satellite Maritime Tracking and Control Department, Jiangyin 214431, China

Abstract

The dislocations and surface roughness in an AlGaN/AlN/GaN heterostructure were analyzed by transmission electron microscopy (TEM) and atomic force microscopy (AFM), respectively, and the mobility limitation mechanisms in the two-dimensional electron gas (2DEG) were studied using a theoretical model that took into account the most important scattering mechanisms. An exponential correlation function provides a better description of the statistical properties of surface roughness than the Gaussian form and thus is adopted in the theoretical model. The calculated results are in good agreement with Hall data. The quantitative measurements of dislocations and surface roughness allow the evaluation of the relative importance of each extrinsic scattering mechanism.

Funder

National Natural Science Foundation of China

Publisher

Hindawi Limited

Subject

General Materials Science

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