Fabrication of ordered ripple patterns on GaAs(100) surface using 60 keV Ar+beam irradiation
Author:
Publisher
Informa UK Limited
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics
Link
http://www.tandfonline.com/doi/pdf/10.1179/1743294413Y.0000000146
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1. Enhanced Lithographic Imaging Layer Meets Semiconductor Manufacturing Specification a Decade Early
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3. Formation of Ordered Nanoscale Semiconductor Dots by Ion Sputtering
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