DeePattern
Author:
Affiliation:
1. Chinese University of Hong Kong
2. Cadence Design Systems, Inc.
Publisher
ACM
Link
https://dl.acm.org/doi/pdf/10.1145/3316781.3317795
Reference26 articles.
1. A fast machine learning-based mask printability predictor for OPC acceleration
2. H. Yang J. Su Y. Zou Y. Ma B. Yu and E. F. Y. Young "Layout hotspot detection with feature tensor generation and deep biased learning " IEEE TCAD 2018. H. Yang J. Su Y. Zou Y. Ma B. Yu and E. F. Y. Young "Layout hotspot detection with feature tensor generation and deep biased learning " IEEE TCAD 2018.
3. M. Shin and J.-H. Lee "Accurate lithography hotspot detection using deep convolutional neural networks " JM3 vol. 15 no. 4 2016. M. Shin and J.-H. Lee "Accurate lithography hotspot detection using deep convolutional neural networks " JM3 vol. 15 no. 4 2016.
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3. Test pattern generation by optimization of the feature space signature;38th European Mask and Lithography Conference (EMLC 2023);2023-10-05
4. Machine Learning in EDA: When and How;2023 ACM/IEEE 5th Workshop on Machine Learning for CAD (MLCAD);2023-09-10
5. DiffPattern: Layout Pattern Generation via Discrete Diffusion;2023 60th ACM/IEEE Design Automation Conference (DAC);2023-07-09
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