Detecting multi-layer layout hotspots with adaptive squish patterns

Author:

Yang Haoyu1,Pathak Piyush2,Gennari Frank2,Lai Ya-Chieh2,Yu Bei1

Affiliation:

1. CUHK

2. Cadence Design Systems Inc.

Publisher

ACM

Reference25 articles.

1. W.-C. Chang I. H.-R. Jiang Y.-T. Yu and W.-F. Liu "iClaire: A fast and general layout pattern classification algorithm " in ACM/IEEE Design Automation Conference (DAC) 2017 pp. 64:1--64:6. 10.1145/3061639.3062263 W.-C. Chang I. H.-R. Jiang Y.-T. Yu and W.-F. Liu "iClaire: A fast and general layout pattern classification algorithm " in ACM/IEEE Design Automation Conference (DAC) 2017 pp. 64:1--64:6. 10.1145/3061639.3062263

2. A Fuzzy-Matching Model With Grid Reduction for Lithography Hotspot Detection

3. K.-J. Chen Y.-K. Chuang B.-Y. Yu and S.-Y. Fang "Minimizing cluster number with clip shifting in hotspot pattern classification " in ACM/IEEE Design Automation Conference (DAC) 2017 pp. 63:1--63:6. 10.1145/3061639.3062283 K.-J. Chen Y.-K. Chuang B.-Y. Yu and S.-Y. Fang "Minimizing cluster number with clip shifting in hotspot pattern classification " in ACM/IEEE Design Automation Conference (DAC) 2017 pp. 63:1--63:6. 10.1145/3061639.3062283

4. B. Yu D. Z. Pan T. Matsunawa and X. Zeng "Machine learning and pattern matching in physical design " in IEEE/ACM Asia and South Pacific Design Automation Conference (ASPDAC) 2015 pp. 286--293. B. Yu D. Z. Pan T. Matsunawa and X. Zeng "Machine learning and pattern matching in physical design " in IEEE/ACM Asia and South Pacific Design Automation Conference (ASPDAC) 2015 pp. 286--293.

5. Accurate lithography hotspot detection based on principal component analysis-support vector machine classifier with hierarchical data clustering

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1. RL-OPC: Mask Optimization With Deep Reinforcement Learning;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2024-01

2. Lithographic Hotspot Detection Using Adaptive Squish Pattern Sampling Combined with Faster R-CNN;2023 IEEE 15th International Conference on ASIC (ASICON);2023-10-24

3. DiffPattern: Layout Pattern Generation via Discrete Diffusion;2023 60th ACM/IEEE Design Automation Conference (DAC);2023-07-09

4. Geometrical positioning surveying-based features for BEOL line-end-pull-back modeling using regression-based machine-learning;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-06-29

5. Bit-Level Quantization for Efficient Layout Hotspot Detection;2023 International Symposium of Electronics Design Automation (ISEDA);2023-05-08

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