LithoROC

Author:

Ye Wei1,Lin Yibo1,Li Meng1,Liu Qiang1,Pan David Z.1

Affiliation:

1. UT Austin

Publisher

ACM

Reference52 articles.

1. J. Xu S. Sinha and C. C. Chiang "Accurate detection for process-hotspots with vias and incomplete specification " in IEEE/ACM International Conference on Computer-Aided Design (ICCAD) 2007 pp. 839--846. J. Xu S. Sinha and C. C. Chiang "Accurate detection for process-hotspots with vias and incomplete specification " in IEEE/ACM International Conference on Computer-Aided Design (ICCAD) 2007 pp. 839--846.

2. Y.-T. Yu Y.-C. Chan S. Sinha I. H.-R. Jiang and C. Chiang "Accurate process-hotspot detection using critical design rule extraction " in ACM/IEEE Design Automation Conference (DAC) 2012 pp. 1167--1172. 10.1145/2228360.2228576 Y.-T. Yu Y.-C. Chan S. Sinha I. H.-R. Jiang and C. Chiang "Accurate process-hotspot detection using critical design rule extraction " in ACM/IEEE Design Automation Conference (DAC) 2012 pp. 1167--1172. 10.1145/2228360.2228576

3. S.-Y. Lin J.-Y. Chen J.-C. Li W.-Y. Wen and S.-C. Chang "A novel fuzzy matching model for lithography hotspot detection " in ACM/IEEE Design Automation Conference (DAC) 2013 pp. 68:1--68:6. 10.1145/2463209.2488817 S.-Y. Lin J.-Y. Chen J.-C. Li W.-Y. Wen and S.-C. Chang "A novel fuzzy matching model for lithography hotspot detection " in ACM/IEEE Design Automation Conference (DAC) 2013 pp. 68:1--68:6. 10.1145/2463209.2488817

4. A Fuzzy-Matching Model With Grid Reduction for Lithography Hotspot Detection

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1. DiffPattern: Layout Pattern Generation via Discrete Diffusion;2023 60th ACM/IEEE Design Automation Conference (DAC);2023-07-09

2. Deep Image Segmentation for Defect Detection in Photo-lithography Fabrication;2023 24th International Symposium on Quality Electronic Design (ISQED);2023-04-05

3. A Unified Framework for Layout Pattern Analysis With Deep Causal Estimation;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023-04

4. Lithography Hotspot Detection Based on Heterogeneous Federated Learning with Local Adaptation and Feature Selection;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2023

5. Hotspot Prediction: SEM Image Generation With Potential Lithography Hotspots;IEEE Transactions on Semiconductor Manufacturing;2023

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