Impact of process variations on emerging memristor

Author:

Niu Dimin,Chen Yiran,Xu Cong,Xie Yuan

Publisher

ACM Press

Cited by 35 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. The study of lithographic variation in resistive random access memory;Journal of Semiconductors;2024-05-01

2. Device-Aware Diagnosis for Yield Learning in RRAMs;2024 Design, Automation & Test in Europe Conference & Exhibition (DATE);2024-03-25

3. CorrectNet+: Dealing With HW Non-Idealities in In-Memory-Computing Platforms by Error Suppression and Compensation;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2024-02

4. Device-Aware Test for Ion Depletion Defects in RRAMs;2023 IEEE International Test Conference (ITC);2023-10-07

5. The True Cost of Errors in Emerging Memory Devices: A Worst-Case Analysis of Device Errors in IMC for Safety-Critical Applications;2023 19th International Conference on Synthesis, Modeling, Analysis and Simulation Methods and Applications to Circuit Design (SMACD);2023-07-03

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