Neural-ILT
Author:
Affiliation:
1. Chinese University of Hong Kong
2. Cornell University
Publisher
ACM
Link
https://dl.acm.org/doi/pdf/10.1145/3400302.3415704
Reference27 articles.
1. Fast Lithographic Mask Optimization Considering Process Variation
2. MOSAIC
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1. Optimizing Predictive AI in Physical Design Flows with Mini Pixel Batch Gradient Descent;Proceedings of the 2024 ACM/IEEE International Symposium on Machine Learning for CAD;2024-09-09
2. AdaOPC 2.0: Enhanced Adaptive Mask Optimization Framework for via Layers;IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2024-09
3. Mask optimization based on conditional generative adversarial nets;2024 4th International Conference on Electronics, Circuits and Information Engineering (ECIE);2024-05-24
4. Model-based OPC Extension in OpenILT;2024 2nd International Symposium of Electronics Design Automation (ISEDA);2024-05-10
5. A self-training end-to-end mask optimization framework based on semantic segmentation network;Integration;2024-05
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