A self-training end-to-end mask optimization framework based on semantic segmentation network-Reference-Cited by-同舟云学术

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A self-training end-to-end mask optimization framework based on semantic segmentation network

Published:2024-05 Issue: Volume:96 Page:102150
ISSN:0167-9260
Container-title:Integration
language:en
Short-container-title:Integration

Author:

Xu Hui,Tang Fuxin^ORCID,Qi Pan,Yuan Ye,Liang Huaguo,Huang Zhengfeng

Publisher

Elsevier BV

Reference25 articles.

1. Advanced Lithography Theory and Application of VLSI;Wei,2016

2. Cramming more components onto integrated circuits;Moore;Proc. IEEE,1998

3. Computational Lithography and Layout Optimization;Wei,2020

4. Optimization of Resolution Enhancement Techniques in Optical Lithography;Ma,2009

5. SRAF insertion via supervised dictionary learning;Geng,2019

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A Review of DNN and GPU in Optical Proximity Correction;2024 2nd International Symposium of Electronics Design Automation (ISEDA);2024-05-10

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