Abstract
Process window is a collection of values of process parameters that allow circuit to be manufactured and to operate under desired specifications. For instance, lithographic process window is typically defined as the set of {focus, exposure} points to control critical dimension (CD) variation to within 10%. One simple way visualizing it is using a Focus-Exposure Matrix (FEM) curve which plots exposure vs. defocus for a given linewidth tolerance. Maximal inscribed rectangle in this plot then represents the process window [1]. Of course, metrics can go beyond linewidth (e.g., sidewall angle) as can process variables (e.g., overlay, temperature). Furthermore, the overall process window for a design will be intersection or overlap of process windows for all different layout patterns existing in the design (e.g., isolated vs. dense lines) [2].
Publisher
Association for Computing Machinery (ACM)
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3. }}NIST/SEMATECH e-Handbook of Statistical Methods http://www.itl.nist.gov/div898 /handbook/ }}NIST/SEMATECH e-Handbook of Statistical Methods http://www.itl.nist.gov/div898 /handbook/
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