A Machine Learning Based Framework for Sub-Resolution Assist Feature Generation-Reference-Cited by-同舟云学术

A Machine Learning Based Framework for Sub-Resolution Assist Feature Generation

Published:2016-04-03 Issue: Volume: Page:
ISSN:
Container-title:Proceedings of the 2016 on International Symposium on Physical Design
language:
Short-container-title:

Author:

Xu Xiaoqing¹,Matsunawa Tetsuaki²,Nojima Shigeki³,Kodama Chikaaki³,Kotani Toshiya³,Pan David Z.¹

Affiliation:

1. University of Texas at Austin, Austin, TX, USA

2. Toshiba Corportation, Yokohama, Japan

3. Toshiba Corporation, Yokohama, Japan

Publisher

ACM

Link

https://dl.acm.org/doi/pdf/10.1145/2872334.2872357

Reference26 articles.

1. Process window enhancement using advanced ret techniques for 20nm contact layer;Ping Y.;Proc. of SPIE,2014

2. S. Banerjee Z. Li and S. R. Nassif "ICCAD-2013 CAD contest in mask optimization and benchmark suite " in IEEE/ACM International Conference on Computer-Aided Design (ICCAD) 2013 pp. 271--274. S. Banerjee Z. Li and S. R. Nassif "ICCAD-2013 CAD contest in mask optimization and benchmark suite " in IEEE/ACM International Conference on Computer-Aided Design (ICCAD) 2013 pp. 271--274.

3. J.-R. Gao X. Xu Y. Bei and D. Z. Pan "MOSAIC: Mask optimizing solution with process window aware inverse correction " in ACM/IEEE Design Automation Conference (DAC) 2014 pp. 52:1--52:6. J.-R. Gao X. Xu Y. Bei and D. Z. Pan "MOSAIC: Mask optimizing solution with process window aware inverse correction " in ACM/IEEE Design Automation Conference (DAC) 2014 pp. 52:1--52:6.

4. Y.-H. Su Y.-C. Huang L.-C. Tsai Y.-W. Chang and S. Banerjee "Fast lithographic mask optimization considering process variation " in IEEE/ACM International Conference on Computer-Aided Design (ICCAD) 2014 pp. 230--237. Y.-H. Su Y.-C. Huang L.-C. Tsai Y.-W. Chang and S. Banerjee "Fast lithographic mask optimization considering process variation " in IEEE/ACM International Conference on Computer-Aided Design (ICCAD) 2014 pp. 230--237.

5. A. Awad A. Takahashi S. Tanaka and C. Kodama "A fast process variation and pattern fidelity aware mask optimization algorithm " in IEEE/ACM International Conference on Computer-Aided Design (ICCAD) 2014 pp. 238--245. A. Awad A. Takahashi S. Tanaka and C. Kodama "A fast process variation and pattern fidelity aware mask optimization algorithm " in IEEE/ACM International Conference on Computer-Aided Design (ICCAD) 2014 pp. 238--245.

Cited by 27 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Geometrical positioning surveying-based features for BEOL line-end-pull-back modeling using regression-based machine-learning;Journal of Micro/Nanopatterning, Materials, and Metrology;2023-06-29

2. Machine Learning-Based Edge Placement Error Analysis and Optimization: A Systematic Review;IEEE Transactions on Semiconductor Manufacturing;2023-02

3. Data-Driven Approaches for Process Simulation and Optical Proximity Correction;Proceedings of the 28th Asia and South Pacific Design Automation Conference;2023-01-16

4. Robustify ML-Based Lithography Hotspot Detectors;Proceedings of the 41st IEEE/ACM International Conference on Computer-Aided Design;2022-10-30

5. 计算光刻研究及进展;Laser & Optoelectronics Progress;2022