Robustify ML-Based Lithography Hotspot Detectors
Author:
Affiliation:
1. Duke University
2. Hong Kong University of Science and Technology
3. Texas A&M University
Publisher
ACM
Link
https://dl.acm.org/doi/pdf/10.1145/3508352.3549389
Reference24 articles.
1. Wild patterns: Ten years after the rise of adversarial machine learning
2. Coupling-aware Dummy Metal Insertion for Lithography
3. Empirical Study of the Topology and Geometry of Deep Networks
4. SRAF Insertion via Supervised Dictionary Learning
5. Ian J Goodfellow , Jonathon Shlens , and Christian Szegedy . 2014. Explaining and harnessing adversarial examples. arXiv preprint arXiv:1412.6572 ( 2014 ). Ian J Goodfellow, Jonathon Shlens, and Christian Szegedy. 2014. Explaining and harnessing adversarial examples. arXiv preprint arXiv:1412.6572 (2014).
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