Growth Nature of InSb Channel Layer on Heteroepitaxial Films of InGaSb Layer on GaSb/Si(111)-√3 × √3-Ga Surface Phase

Author:

Ali Mohammad Monzur-Ul-Akhir Ahmed1,Mori Masayuki1,Maezawa Koichi1

Affiliation:

1. Nano & Functional Material Sciences, Graduate School of Science & Engineering, University of Toyama

Publisher

Surface Science Society Japan

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanics of Materials,Condensed Matter Physics,Bioengineering,Biotechnology

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Influence of Composition Ratio of In and Ga Atoms of InGaSb Bi-layer on Growth of InGaSb Thin Films on Si(111) Substrate;e-Journal of Surface Science and Nanotechnology;2022-12-08

2. An investigation of the crystalline nature for GaSb films on Si(111) at varied growth temperature and growth rate;Japanese Journal of Applied Physics;2019-07-17

3. Effect of flux ratio on GaSb films grown at a low temperature on Si(111);2019 Joint 8th International Conference on Informatics, Electronics & Vision (ICIEV) and 2019 3rd International Conference on Imaging, Vision & Pattern Recognition (icIVPR);2019-05

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