Synchrotron X-ray scattering techniques for microelectronics-related materials studies-Reference-Cited by-同舟云学术

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Synchrotron X-ray scattering techniques for microelectronics-related materials studies

Published:2000-07 Issue:4 Volume:44 Page:457-476
ISSN:0018-8646
Container-title:IBM Journal of Research and Development
language:
Short-container-title:IBM J. Res. & Dev.

Author:

Jordan-Sweet J. L.

Publisher

IBM

Subject

General Computer Science

Link

http://xplorestaging.ieee.org/ielx5/5288520/5389139/05389144.pdf?arnumber=5389144

Cited by 18 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Structural, thermal, and transport properties of La0.67Sr0.33MnO3 nanoparticles synthesized via the sol–gel auto-combustion technique;RSC Advances;2018

2. Multi-technique x-ray and optical characterization of crystalline phase, texture, and electronic structure of atomic layer deposited Hf1−xZrxO2 gate dielectrics deposited by a cyclical deposition and annealing scheme;Journal of Applied Physics;2013-06-21

3. Structural study of Bi2Sr2CaCu2O8+δ exfoliated nanocrystals;Applied Physics Letters;2012-11-26

4. Texturing and Tetragonal Phase Stabilization of ALD HfxZr1-xO2 Using a Cyclical Deposition and Annealing Scheme;ECS Transactions;2012-04-27

5. Structural properties of epitaxial SrHfO3 thin films on Si (001);Thin Solid Films;2010-01

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