A statistical approach to quality control of non-normal lithographical overlay distributions-Reference-Cited by-同舟云学术

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A statistical approach to quality control of non-normal lithographical overlay distributions

Published:1992-09 Issue:5 Volume:36 Page:835-844
ISSN:0018-8646
Container-title:IBM Journal of Research and Development
language:
Short-container-title:IBM J. Res. & Dev.

Author:

Booth R. M.,Tallman K. A.,Wiltshire T. J.,Yee P. L.

Publisher

IBM

Subject

General Computer Science

Link

http://xplorestaging.ieee.org/ielx5/5288520/5389687/05389691.pdf?arnumber=5389691

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterizing interlayer edge placement with SEM contours;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-04-15

2. Overlay error statistics for multiple-exposure patterning;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-04-04

3. Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 2: Image Placement, Device Overlay, and Critical Dimension;Journal of Micro/Nanolithography, MEMS, and MOEMS;2016-06-30

4. Skewness and Kurtosis Risks of Quality Control in Overlay Inspection;Japanese Journal of Applied Physics;2010-06-21

5. Run-to-run control and performance monitoring of overlay in semiconductor manufacturing;Control Engineering Practice;2004-07

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