Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 2: Image Placement, Device Overlay, and Critical Dimension-Reference-Cited by-同舟云学术

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Special Section Guest Editorial: Control of Integrated Circuit Patterning Variance, Part 2: Image Placement, Device Overlay, and Critical Dimension

Published:2016-06-30 Issue:2 Volume:15 Page:021401
ISSN:1932-5150
Container-title:Journal of Micro/Nanolithography, MEMS, and MOEMS
language:en
Short-container-title:J. Micro/Nanolith. MEMS MOEMS

Author:

Starikov Alexander

Publisher

SPIE-Intl Soc Optical Eng

Subject

Electrical and Electronic Engineering,Mechanical Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference6 articles.

1. Introduction to VLSI systems, 1978 Prepublication drafts;Mead,2016

2. Reminiscences of the VLSI Revolution: How a Series of Failures Triggered a Paradigm Shift in Digital Design

3. Enabling scanning electron microscope contour-based optical proximity correction models

4. Fast optical and process proximity correction algorithms for integrated circuit manufacturing;Cobb,1998

5. A statistical approach to quality control of non-normal lithographical overlay distributions

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Overlay error statistics for multiple-exposure patterning;Journal of Micro/Nanolithography, MEMS, and MOEMS;2019-04-04

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