High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits
-
Published:1999-01
Issue:1.2
Volume:43
Page:109-126
-
ISSN:0018-8646
-
Container-title:IBM Journal of Research and Development
-
language:
-
Short-container-title:IBM J. Res. & Dev.
Subject
General Computer Science
Cited by
45 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献