Stress Intensity of Delamination in a Sintered-Silver Interconnection

Author:

DeVoto D. J.1,Paret P. P.1,Wereszczak A. A.2

Affiliation:

1. * Transportation and Hydrogen Systems Center, National Renewable Energy Laboratory, Golden, CO 80401

2. § Materials and Science Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831

Abstract

In automotive power electronics packages, conventional thermal interface materials such as greases, gels, and phase-change materials pose bottlenecks to heat removal and are also associated with reliability concerns. The industry trend is toward high thermal performance bonded interfaces for large-area attachments. However, because of coefficient of thermal expansion mismatches between materials/layers and resultant thermomechanical stresses, adhesive and cohesive fractures could occur, posing a reliability problem. These defects manifest themselves in increased thermal resistance. This research aims to investigate and improve the thermal performance and reliability of sintered-silver for power electronics packaging applications. This has been experimentally accomplished by the synthesis of large-area bonded interfaces between metalized substrates and copper base plates that have subsequently been subjected to thermal cycles. A finite element model of crack initiation and propagation in these bonded interfaces will allow for the interpretation of degradation rates by a crack-velocity (V)-stress intensity factor (K) analysis. A description of the experiment and the modeling approach are discussed.

Publisher

IMAPS - International Microelectronics Assembly and Packaging Society

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