Erosion behavior of Y 2 O 3 in fluorine‐based etching plasmas: Orientation dependency and reaction layer formation-Reference-Cited by-同舟云学术

Erosion behavior of Y 2 O 3 in fluorine‐based etching plasmas: Orientation dependency and reaction layer formation

Published:2020-11-26 Issue:3 Volume:104 Page:1465-1474
ISSN:0002-7820
Container-title:Journal of the American Ceramic Society
language:en
Short-container-title:J. Am. Ceram. Soc.

Author:

Kindelmann Moritz¹²^ORCID,Stamminger Mark³,Schön Nino¹⁴^ORCID,Rasinski Marcin¹^ORCID,Eichel Rüdiger‐A.¹⁴⁵^ORCID,Hausen Florian¹⁴⁵^ORCID,Bram Martin¹^ORCID,Guillon Olivier¹²⁵^ORCID

Affiliation:

1. Institute of Energy and Climate Research Forschungszentrum Jülich GmbH Jülich Germany

2. Institute of Mineral Resources Engineering RWTH Aachen University Aachen Germany

3. Institute of Experimental Physics II Ruhr‐Universität Bochum Bochum Germany

4. Institute of Physical Chemistry RWTH Aachen University Aachen Germany

5. JARA‐Energy Jülich Aachen Research Alliance Jülich Germany

Publisher

Wiley

Subject

Materials Chemistry,Ceramics and Composites

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1111/jace.17556

Reference33 articles.

1. Dry Etching Technology for Semiconductors

2. Etching mechanism of Y2O3 thin films in high density Cl2/Ar plasma;Kim Y‐C;J Vac Sci Technol, A,2001

3. Plasma-Resistant Dense Yttrium Oxide Film Prepared by Aerosol Deposition Process

4. The erosion behaviors of Y2O3 and YF3 coatings under fluorocarbon plasma

5. Reactive ion etching of quartz and silica‐based glasses in CF4/CHF3 plasmas;Leech PW;Vacuum,1999

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