Author:
Kim Dae-Min,Oh Yoon-Suk,Kim Seongwon,Kim Hyung-Tae,Lim Dae-Soon,Lee Sung-Min
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
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5. Study of the SiO2-to-Si3N4 etch selectivity mechanism in inductively coupled fluorocarbon plasmas and a comparison with the SiO2-to-Si mechanism
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