Low-Pressure Chemical Vapor Deposition of alpha-Si3N4 from SiF4 and NH3: Kinetic Characteristics
Author:
Publisher
Wiley
Subject
Materials Chemistry,Ceramics and Composites
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1111/j.1151-2916.1992.tb04484.x/fullpdf
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