Three Dimensional Structures of Negative-tone Photoresist by Binary Optics
Author:
Affiliation:
1. Faculty of Science and Technology, Department of Applied Physycs and Physico-Imformatics, Keio University
Publisher
Institute of Electrical Engineers of Japan (IEE Japan)
Subject
Electrical and Electronic Engineering,Mechanical Engineering
Link
https://www.jstage.jst.go.jp/article/ieejsmas/125/10/125_10_424/_pdf
Reference3 articles.
1. (1) R. Mori, K. Hanai, and Y. Matsumoto: “Three Dimensional Micro Fabrication of Photoresist and Resin Materials by Using Gray-scale Lithography and Molding”, IEEJ Trans. SM. Vol. 124, No. 10, pp. 359-363 (2004-10)(in Japanese)
2. (2) M. B. Stern: “Binary optics fabrication”, in Micro-optics: Elements systems, and applications, pp. 53-85 (1997)
3. (3) K. Hanai and Y. Matsumoto: “A Study of Gray Scale Lithography with Micro Chrome Pattern”, T. IEE Japan, Vol. 123-E, No. 10, pp. 410-415 (2003-10) (in Japanese)
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